Silicon Carbide Substrate Cleaning Solutions
Contact your Entegris account manager or
- CMP
Specifications
| Product | Application |
| TCL 185/186 | Pad and wafer cleaning solution. Highly effective in neutralizing CMP slurry oxidizer. |
| SNST-CLN3/5 | Pad and wafer cleaning solution. Neutralizes oxidizer and reduces particle counts on wafer. |
| PCL 565 | Industry-leading cleaning chemistry for SiC, optimized for excellent particle reduction of surface contamination generated from various processing steps. |
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