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Solaris® APR CMP Disposable Filter

Utilizing patented, multilayer depth-type media, Solaris APR (advanced particle reduction) filters effectively reduce most large abrasive and slurry agglomerates in advanced node CMP processes.

  • Patented, multilayer media provides high retention, helping to reduce wafer defects and improve yield
  • Media design absorbs fine particles, minimizing inefficient post-CMP cleans and increasing overall cost of ownership
  • Low hold-up volume reduces waste and setup time
  • Self-venting filtration eliminates dead space and potential for slurry dry-out in the filration media
  • Disposable Connectology® design allows for quick installation, eliminates downtime, and limits operator handling of hazardous chemicals during installation
  • Read More Read Less
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