The advent of the AI era is calling for a breakthrough in memory technology and semiconductor materials. This year, SMC Korea covers the advancement of next-generation memory technologies to respond to the AI-led technological revolution, as well as the latest semiconductor materials and manufacturing technologies to underpin it.
Join Entegris’ Senior Director, Market and Technical Solutions Yohan Ahn for his presentation “Technological Trends and Necessity of Material Contamination and Filtration for Wafer Defectivity Control in HBM Manufacturing” and discover the latest trends in filtration and purification technologies aimed at minimizing the impact of particles and impurities in the material ecosystem.
The advent of the AI era is calling for a breakthrough in memory technology and semiconductor materials. This year, SMC Korea covers the advancement of next-generation memory technologies to respond to the AI-led technological revolution, as well as the latest semiconductor materials and manufacturing technologies to underpin it.
Join Entegris’ Senior Director, Market and Technical Solutions Yohan Ahn for his presentation “Technological Trends and Necessity of Material Contamination and Filtration for Wafer Defectivity Control in HBM Manufacturing” and discover the latest trends in filtration and purification technologies aimed at minimizing the impact of particles and impurities in the material ecosystem.
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Featured Presentation
May 14 | 2:50 – 3:20 p.m.
Technological Trends and Necessity of Material Contamination and Filtration for Wafer Defectivity Control in HBM Manufacturing
As the commercialization of artificial intelligence (AI) and the advancement of technologies such as high-performance computing (HPC) and deep learning (DL) progress, the need to process large amounts of data quickly has emerged. Traditional DDR and GDDR memory have limited bandwidth, so high bandwidth memory (HBM), which offers higher performance, has been commercialized, driving the development of new technologies.
Compared to traditional memory chips, HBM has increased chip size and higher defectivity vulnerability due to chip stacking processes. This has led to new technical approaches for wafer defectivity control across the entire material ecosystem.
This presentation reviews the latest trends in filtration and purification technologies aimed at minimizing the impact of particles and impurities in this material ecosystem. By examining current high-volume manufacturing (HVM) devices and next-generation HBM-related technologies, we aim to contribute to wafer defect control.
About the Entegris Presenter
Yohan Ahn, Senior Director, Market and Technical Solutions
Yohan Ahn has been working in the field of Contamination Control Technology in the semiconductor industry for over 30 years at Samsung and Entegris. He is currently leading the Global MTS (Market and Technical Solutions) organization at Entegris, where he oversees contamination control tasks within the ecosystem of semiconductor manufacturing processes and materials. Specifically, Yohan focuses on the impurities in liquid chemicals and the resulting process contamination, as well as filtration and purification tasks to control these issues. Yohan received his bachelor’s degree in Electronic Materials Engineering from Kwangwoon University.
Event Related Content
Exploration of UPE Membrane Technology in Point-Of-Use EUV CAR Photoresist Filtration
This study highlights the pivotal role of advanced filtration strategies in addressing the unique challenges posed by EUV CAR resists, where precise pore size control is essential for mitigating bridge defectivity and ensuring pattern fidelity.
The goal of the study is to understand the contaminants natively present in semiconductor grade hydrogen peroxide (H₂O₂) utilizing a hybrid metrology approach with techniques such as Inductively Coupled Plasma Mass Spectrometry (ICP-MS), Liquid Particle Counting (LPC), Scanning Mobility Particle Sizer (SMPS) and Time of Flight Mass Spectrometer (TOF-MS) to develop a profile of contaminants present.
Watch Kusum Maharjan, Entegris applications engineer, highlight the use of hybrid metrology to characterize the contaminants found in a recent study of hydrogen peroxide.